Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES
Publications
509 results at JES
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to Tantalum
- Yue Kuo
- 2019
- JES
Investigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue Removal
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 2019
- JES
Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 Plasmas
- W.A. Lanford
- 2019
- JES
Chemical vapor deposition of gold
- Carl E. Larson
- Thomas H. Baum
- et al.
- 2019
- JES
Defect Clustering and Boron Electrical Deactivation in P-Doped Polycrystalline Diamond Films
- Dario Narducci
- C. Richard Guarnieri
- et al.
- 2019
- JES
Electrical studies on annealed d2 plasma-exposed silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 2019
- JES
Corrosion and Passivation of Fe and FeN Films
- V. Brusic
- G.S. Frankel
- et al.
- 2019
- JES
Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
- Jean M.J. Fréchet
- Theodore G. Tessier
- et al.
- 2019
- JES
Electrical Properties of Chemical-Mechanical Polished Tetraethyl Orthosilicate Films with and Without Capping Layers
- S. Cohen
- M.A. Jaso
- et al.
- 2019
- JES