Adsorption of boron on Si(111): Physics, chemistry, and atomic-scale electronic devices
- Ph. Avouris
- In-Whan Lyo
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
3510 results for Materials Discovery
The importance of free radical recombination reactions in CF4 /02 plasma etching of silicon
- K.F. Jensen
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The physical description of films coating quartz resonators
- K.Keiji Kanazawa
- 1990
- Thin Solid Films
Atomic structure of alkali metal overlayers on the Si(001) surface
- Inder P. Batra
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Properties of W-N and Mo-N films prepared by reactive sputtering
- K.K. Shih
- D.B. Dove
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Properties of diamond structure SnGe films grown by molecular beam epitaxy
- Alex Harwit
- P.R. Pukite
- et al.
- 1990
- Thin Solid Films
Bonding at silicon/insulator interfaces
- F.J. Himpsel
- T.F. Heinz
- et al.
- 1990
- Applied Surface Science
Fundamental experimental studies in tribology: The transition from "interfacial" friction of undamaged molecularly smooth surfaces to "normal" friction with wear
- Andrew M. Homola
- Jacob N. Israelachvili
- et al.
- 1990
- Wear
Ta as a barrier for the Cu/PtSi, Cu/Si, and Al/PtSi structures
- Chin-An Chang
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Sputtered tungsten for deep submicroncomplementary metal-oxide-semiconductor technology
- L. Dori
- A.C. Megdanis
- et al.
- 1990
- Thin Solid Films