A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Publications
3593 results for Mathematical Sciences
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
1X deep UV lithography with chemical amplification for 1-micron DRAM production
- John G. Maltabcs
- Steven J. Holmes
- et al.
- 1990
- Microlithography 1990
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990
Dynamic detection of subgraphs in computer networks
- Israel Cidon
- Inder S. Gopal
- 1990
- Algorithmica
A unification of Liouvillian extensions
- Manuel Bronstein
- 1990
- Applicable Algebra in Engineering, Communication and Computing
Smallest scale estimates for the Navier-Stokes equations for incompressible fluids
- W.D. Henshaw
- H.O. Kreiss
- et al.
- 1990
- Archive for Rational Mechanics and Analysis
Minimalist Light Striping for a Mobile Robot
- Jonathan Connell
- 1989
- Proceedings of SPIE 1989
Rapid adaptive segmentation by estimation and reassignment of uncertainty pixels
- Arturo A. Rodriguez
- O.R. Mitchell
- 1989
- Proceedings of SPIE 1989