Silicon oxidation during bilayer resist etching
- Mark A. Hartney
- Justin N. Chiang
- et al.
- 1989
- Proceedings of SPIE 1989
Publications
3593 results for Mathematical Sciences
Second-harmonic diffraction from periodically modulated molecular monolayers
- T.F. Heinz
- T. Suzuki
- 1989
- Proceedings of SPIE 1989
Laser photothermal effects for measurements and materials processing
- Andrew C. Tam
- 1989
- SPIE OE/LASE 1989
A suprathreshold ferry-porter law: Implications for the measurement of display flicker
- Bernice E. Rogowitz
- 1989
- Proceedings of SPIE 1989
The role of unsteady adiabatic expansion in laser sputtering
- Roger Kelly
- 1989
- Proceedings of SPIE 1989
Ablation of polymers and tissue by ultraviolet lasers
- R. Srinivasan
- 1989
- Proceedings of SPIE 1989
Aqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Bench evaluation of lithographic lenses from measurements of the point spread function
- Norman Bobroff
- Petra Fadi
- et al.
- 1989
- Proceedings of SPIE 1989
Chromium mask damage in excimer laser projection processing
- J.T.C. Yeh
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989