Effects of biased cosputtering on resistivity and step coverage in tungsten silicide films
- K.W. Choi
- K.Y. Ahn
- 1985
- JVSTA
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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- Materials Discovery
3421 results for Materials Discovery
Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA
Summary Abstract: Chromium as an inert marker in copper oxidation
- M.A. Frisch
- 1985
- JVSTA
Rotational polarization in NO scattering from Ag(111)
- A.W. Kleyn
- A.C. Luntz
- et al.
- 1985
- Surface Science
Structure and properties of coevaporated WSix films
- K.Y. Ahn
- S.R. Herd
- et al.
- 1985
- JVSTA
Thin films for optical data storage
- Wen-yaung Lee
- 1985
- JVSTA
Unoccupied surface state and conduction band critical points of GaP(110): A high resolution inverse photoemission study
- D. Straub
- M. Skibowski
- et al.
- 1985
- JVSTA
A helium diffraction study of O2 chemisorption on Ni(110)
- T. Engel
- K.H. Rieder
- et al.
- 1984
- Surface Science
Helium-surface interaction potential: Determination and applications
- Inder P. Batra
- 1984
- Surface Science