Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
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Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- Keith T. Kwietniak
- Michael G. Rosenfield
- et al.
- 1993
- Microlithography 1993