Hardware-assisted 3D TCAD for predictive capacitance extraction in 32nm SOI SRAMsAjay N. BhojRajiv Joshiet al.2011IEDM 2011
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applicationsS. KrishnanU. Kwonet al.2011IEDM 2011