Application of cyclic fluorocarbon/argon discharges to device patterning
- Dominik Metzler
- Kishore Uppireddi
- et al.
- 2016
- JVSTA
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176 results at JVSTA
In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance
- Nathan Marchack
- Taeseung Kim
- et al.
- 2015
- JVSTA
Detection of charge carrier confinement into mobile ionic defects in nanoporous dielectric films for advanced interconnects
- Juan Borja
- Joel L. Plawsky
- et al.
- 2014
- JVSTA
Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
- Dominik Metzler
- Robert L. Bruce
- et al.
- 2013
- JVSTA
History of atomic layer deposition and its relationship with the American Vacuum Society
- Gregory N. Parsons
- Jeffrey W. Elam
- et al.
- 2013
- JVSTA
Three dimensional reciprocal space measurement by x-ray diffraction using linear and area detectors: Applications to texture and defects determination in oriented thin films and nanoprecipitates
- Simon Gaudet
- Koen De Keyser
- et al.
- 2013
- JVSTA
MnP nanoclusters embedded in GaP epitaxial films grown by organometallic vapor-phase epitaxy: A reciprocal space mapping and transmission electron microscopy study
- Samuel Lambert-Milot
- Simon Gaudet
- et al.
- 2012
- JVSTA
Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation
- H. Sinha
- D.B. Straight
- et al.
- 2010
- JVSTA
In situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100)
- W. Knaepen
- J. Demeulemeester
- et al.
- 2009
- JVSTA
Interaction of metals with model polymer surfaces: Core level photoemission studies
- P.N. Sanda
- J.W. Bartha
- et al.
- 1986
- JVSTA