Investigation of island formation during through-mask electrochemical micromachining
- R.V. Shenoy
- M. Datta
- et al.
- 1996
- JES
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Nonphotosensitive, vertically redundant two-channel a-Si:H thin film transistor
- Yue Kuo
- 1996
- JES
Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
- I. Teerlinck
- P.W. Mertens
- et al.
- 1996
- JES
Etching of tantalum in fluorine-containing high density plasmas
- R. Hsiao
- D.C. Miller
- 1996
- JES
Electromigration drift velocity in Al-alloy and Cu-alloy lines
- C.-K. Hu
- K.Y. Lee
- et al.
- 1996
- JES
Plasma Etching and Deposition for a-Si: H Thin Film Transistors
- Yue Kuo
- 1995
- JES
Screening of charged electrodes in aqueous electrolytes
- James N. Glosli
- 1995
- JES
Electrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections
- J. Roeder
- H. Deligianni
- et al.
- 1995
- JES
Repassivation Transients Measured with the Breaking-Electrode Technique on Aluminum Thin-Film Samples
- C.V. Jahnes
- V. Brusic
- et al.
- 1995
- JES
Low Temperature Atmospheric Pressure Chemical Vapor Deposition for Epitaxial Growth of SiGe Bipolar Transistors
- D.A. Grutzmacher
- D.A. Grutzmacher
- 1995
- JES