Thin-film transformations and volatile products in the formation of nanoporous low- k polymethylsilsesquioxane-based dielectric
- P. Lazzeri
- L. Vanzetti
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Etching silicon-containing bilayer resists in ammonia-based plasmas
- Siddhartha Panda
- Richard Wise
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature
- Marcus A. Worsley
- Stacey F. Bent
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fourier transform infrared spectroscopy studies of water-polymer interactions in chemically amplified photoresists
- Laurie A. McDonough
- Viktor Chikan
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Effects of amine- and pyridine-terminated molecular nanolayers on adhesion at Cu-SiO 2 interfaces
- P.G. Ganesan
- G. Cui
- et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Temperature dependent defect formation and charging in hafnium oxides and silicates
- D. Lim
- R. Haight
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Immersion lithography: New opportunities for semiconductor manufacturing
- Darío Gil
- Timothy A. Brunner
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Ultrathin membrane, masks for electron projection lithography
- O.R. Wood II
- W.J. Trybula
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures