X-Ray Absorption Study of Electrochemically Grown Oxide Films on AlCr Sputtered Alloys
- A.J. Davenport
- H.S. Isaacs
- et al.
- 1994
- JES
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Intrinsic and Passivation-Induced Trench Tapering during Plasma Etching
- S. Hamaguchi
- M. Dalvie
- 1994
- JES
Electrochemically Deposited Diffusion Barriers
- Milan Paunovic
- Robert G. Schad
- et al.
- 1994
- JES
High Selectivity Magnetically Enhanced Reactive Ion Etching of Boron Nitride Films
- Bernhard Neureither
- Son Nguyen
- et al.
- 1994
- JES
Electrolytic Codeposition of Ni-γAl2O3 Thin Films
- Patrick R. Webb
- Neil L. Robertson
- 1994
- JES
Chemical Vapor Deposited Copper from Alkyne Stabilized Copper (I) Hexafluoroacetylacetonate Complexes
- Thomas H. Baum
- Carl E. Larson
- 1993
- JES
High-Resolution Depth Profiling of Ultrathin Silicon Oxide/Nitride/Oxide Layers
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- JES
Electrical Resistance and Stress of Bilayer Co(P)/Cu and Ni(P)/Cu Thin Films
- M. Paunovic
- L. Clevenger
- et al.
- 1993
- JES
Corrosion Inhibition of Cobalt with a Thin Film of Cu-BTA
- B.M. Rush
- G.S. Frankel
- et al.
- 1993
- JES
Growth Rate Enhancement of Heavy n- and P-Type Doped Silicon Deposited by Atmospheric-Pressure Chemical Vapor Deposition at Low Temperatures
- P. Agnello
- T.O. Sedgwick
- et al.
- 1993
- JES