Intrinsic and Passivation-Induced Trench Tapering during Plasma Etching
- S. Hamaguchi
- M. Dalvie
- 1994
- JES
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Shallow n+ Junctions in Silicon by Arsenic Gas-Phase Doping
- J.F. DeGeolormo
- D.K. Sodana
- et al.
- 1994
- JES
High Selectivity Magnetically Enhanced Reactive Ion Etching of Boron Nitride Films
- Bernhard Neureither
- Son Nguyen
- et al.
- 1994
- JES
The C49 to C54 Phase Transformation in TiSi2Thin Films
- L. Clevenger
- R. Mann
- 1994
- JES
Thin Film Transistors with Graded SiNx Gate Dielectrics
- Yue Kuo
- 1994
- JES
Growth Rate Enhancement of Heavy n- and P-Type Doped Silicon Deposited by Atmospheric-Pressure Chemical Vapor Deposition at Low Temperatures
- P. Agnello
- T.O. Sedgwick
- et al.
- 1993
- JES
High-Resolution Depth Profiling of Ultrathin Silicon Oxide/Nitride/Oxide Layers
- G.M.W. Kroesen
- G.S. Oehrlein
- et al.
- 1993
- JES
Electrical Resistance and Stress of Bilayer Co(P)/Cu and Ni(P)/Cu Thin Films
- M. Paunovic
- L. Clevenger
- et al.
- 1993
- JES
Corrosion Inhibition of Cobalt with a Thin Film of Cu-BTA
- B.M. Rush
- G.S. Frankel
- et al.
- 1993
- JES
On the Pitting Resistance of Sputter-Deposited Aluminum Alloys
- R.C. Newman
- C.V. Jahnes
- et al.
- 1993
- JES