A method for increasing the etch-rate ratio of oxides to nonoxides in inert-gas ion milling processes
- U. Gerlach-Meyer
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
Publications
2357 results at Journal of Applied Physics
Shallow junctions by high-dose As implants in Si: Experiments and modeling
- M.Y. Tsai
- F.F. Morehead
- et al.
- 2008
- Journal of Applied Physics
Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density
- J.W. Coburn
- M. Chen
- 2008
- Journal of Applied Physics
Shallow silicide contact
- K.N. Tu
- W.N. Hammer
- et al.
- 2008
- Journal of Applied Physics
The implication of flow-rate dependencies in plasma etching
- B.N. Chapman
- T.A. Hansen
- et al.
- 2008
- Journal of Applied Physics
The thin-film formation of rhodium silicides
- S. Petersson
- R.L. Anderson
- et al.
- 2008
- Journal of Applied Physics
Magnetocrystalline anisotropy in epitaxially grown (Gd,Tm,Y) 3(Fe,Ga)5O12 garnet thin films
- A. Gangulee
- R.J. Kobliska
- 2008
- Journal of Applied Physics
Quasiresonant laser-produced plasma: An efficient mechanism for localized breakdown
- A.C. Tam
- 2008
- Journal of Applied Physics
The application of elastobirefringence to the study of strain fields and dislocations in III-V compounds
- H. Booyens
- J.H. Basson
- 2008
- Journal of Applied Physics
Dipole layers at the metal-SiO2 interface
- T.W. Hickmott
- 2008
- Journal of Applied Physics