Sensitivity analysis of markup equilibria in complementary markets
- José R. Correa
- Roger Lederman
- et al.
- 2014
- Operations Research Letters
Publications
3558 results for Mathematical Sciences
Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- T.A. Brunner
- V. Menon
- et al.
- 2014
- SPIE Advanced Lithography 2014
Fast detection of novel problematic patterns based on dictionary learning and prediction of their lithographic difficulty
- F. De Morsier
- David Demaris
- et al.
- 2014
- SPIE Advanced Lithography 2014
Computational lithography platform for 193i-guided directed self-assembly
- Kafai Lai
- Melih Ozlem
- et al.
- 2014
- SPIE Advanced Lithography 2014
Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Automated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Towards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Spin-on organic hardmask for topo-patterned substrate
- Kazuhiko Komura
- Yoshi Hishiro
- et al.
- 2014
- SPIE Advanced Lithography 2014
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014