Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2001
- IBM J. Res. Dev
Publications
745 results at IBM J. Res. Dev
Organic thin-film transistors: A review of recent advances
- C. Dimitrakopoulos
- D.J. Mascaro
- 2001
- IBM J. Res. Dev
Printing meets lithography: Soft approaches to high-resolution printing
- Bruno Michel
- A. Bernard
- et al.
- 2001
- IBM J. Res. Dev
High-throughput coherence control and hardware messaging in Everest
- A.K. Nanda
- A.-T. Nguyen
- et al.
- 2001
- IBM J. Res. Dev
On internal organization in compressed random-access memories
- P.A. Franaszek
- John T. Robinson
- 2001
- IBM J. Res. Dev
Proactive management of software aging
- V. Castelli
- R. Harper
- et al.
- 2001
- IBM J. Res. Dev
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
- Hiroshi Ito
- 2001
- IBM J. Res. Dev
Organic-inorganic electronics
- D.B. Mitzi
- K. Chondroudis
- et al.
- 2001
- IBM J. Res. Dev
Colloidal synthesis of nanocrystals and nanocrystal superlattices
- C.B. Murray
- S. Sun
- et al.
- 2001
- IBM J. Res. Dev
Experience with building a commodity intel-based ccNUMA system
- B. Brock
- G. Carpenter
- et al.
- 2001
- IBM J. Res. Dev