The rational design of bleachable non-chemically amplified DUV photoactive compounds
- Benjamen M. Rathsack
- Peter I. Tattersall
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Publications
Date
Featured collections
Popular topics
101 results at Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Image collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Post-modification as a way to improve the lithographic performance of resist materials
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Silicon-containing resists for 157 nm applications
- Ratnam Sooriyakumaran
- Debra Fenzel-Alexander
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
- William Hinsberg
- Seok-Won Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering