SMO photomask inspection in the lithographic planeEmily GallagherKaren Badgeret al.2009SPIE Photomask Technology + EUV Lithography 2009
Isotropic treatment of EMF effects in advanced photomasksJaione Tirapu AzpirozAlan E. Rosenbluthet al.2009SPIE Photomask Technology + EUV Lithography 2009