Implementation of robust nickel alloy salicide process for high-performance 65nm SOI CMOS manufacturing
- Jay Strane
- David Brown
- et al.
- 2007
- VLSI-TSA 2007
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5 results at VLSI-TSA 2007
35nm SOI-CMOS for sub-ambient temperature operation
- Cai Jin
- David J. Frank
- et al.
- 2007
- VLSI-TSA 2007
Band edge high-K /metal gate n-MOSFETs using ultra thin capping layers
- V.K. Paruchuri
- V. Narayanan
- et al.
- 2007
- VLSI-TSA 2007
Asymmetrical SRAM cells with enhanced read and write margins
- Keunwoo Kim
- Jae-Joon Kim
- et al.
- 2007
- VLSI-TSA 2007
Phase-change memory development status
- Alejandro Schrott
- Hsiang-Lan Lung
- et al.
- 2007
- VLSI-TSA 2007