The problem of optimal placement of Sub-Resolution Assist Features (SRAF)
- Maharaj Mukherjee
- Scott Mansfield
- et al.
- 2005
- SPIE Advanced Lithography 2005
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3 results at SPIE Advanced Lithography 2005
First microprocessors with immersion lithography
- D. Gil
- T. Bailey
- et al.
- 2005
- SPIE Advanced Lithography 2005
Resist blur and line edge roughness
- Gregg M. Gallatin
- 2005
- SPIE Advanced Lithography 2005