Your worst Nightmare - Inspection of aggressive OPC on 14 nm masks with emphasis on defect sensitivity and wafer defect print predictability
- Karen D. Badger
- Michael Hibbs
- et al.
- 2013
- SPIE Photomask Technology 2013
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2 results at SPIE Photomask Technology 2013
Two-dimensional mask effects at the 14 nm logic node
- A.E. Zweber
- A.E. McGuire
- et al.
- 2013
- SPIE Photomask Technology 2013