Paving the way to a full chip gate level double patterning application
- Henning Haffner
- Jason Meiring
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
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3 results at SPIE Photomask Technology + EUV Lithography 2007
Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs
- Donald Samuels
- Ian Stobert
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
The effect of the OPC parameters on the performance of the OPC model
- Amr Abdo
- Ahmed Seoud
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007