Characterization of a next generation step-and-scan system
- Timothy J. Wiltshire
- Joseph P. Kirk
- et al.
- 1998
- SPIE Advanced Lithography 1998
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4 results at SPIE Advanced Lithography 1998
DUV stability of carbon films for attenuated phase shift mask applications
- Alessandro Callegari
- Katherina Babich
- et al.
- 1998
- SPIE Advanced Lithography 1998
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Optical lens specifications from the user's perspective
- Christopher J. Progler
- Donald C. Wheeler
- 1998
- SPIE Advanced Lithography 1998