Charge trapping and detrapping in HfO2 high-κ MOS capacitors using internal photoemission
- D. Felnhofer
- E. Gusev
- et al.
- 2005
- INFOS 2005
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Interface state generation in pFETs with ultra-thin oxide and oxynitride on (100) and (110) Si substrates
- J.H. Stathis
- R. Bolam
- et al.
- 2005
- INFOS 2005