Scattered light: The increasing problem for 193 nm exposure tools and beyond
- Kafai Lai
- Chung-Hsi Wu
- et al.
- 2001
- Microlithography 2001
Publications
Date
Featured collections
Popular topics
3 results at Microlithography 2001
Aids for driving lithography hard: Wafer level process control features
- Emily Fisch
- Reginald Bowley
- et al.
- 2001
- Microlithography 2001
Investigation on the mechanism of the 193nm resist linewidth reduction during the SEM measurement
- C.-H.J. Wu
- Wu-Song Huang
- et al.
- 2001
- Microlithography 2001