193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Publications
6 results at Microlithography 1995
Kinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
High-aspect-ratio resist for thick-film applications
- N. LaBianca
- J. Gelorme
- 1995
- Microlithography 1995
Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
Influence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization
- Hiroshi Ito
- G. Breyta
- et al.
- 1995
- Microlithography 1995
Performance properties of near-monodisperse novolak resins
- R.D. Allen
- K.J. Chen
- et al.
- 1995
- Microlithography 1995