Reduction of linewidth variation over reflective topography
- Steve S. Miura
- Christopher F. Lyons
- et al.
- 1992
- Microlithography 1992
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9 results at Microlithography 1992
Direct phase measurements in phase-shift masks
- A.P. Ghosh
- D.B. Dove
- 1992
- Microlithography 1992
Application of atomic-force microscopy to phase-shift masks
- A.P. Ghosh
- D.B. Dove
- et al.
- 1992
- Microlithography 1992
Acid generation and acid diffusion in photoresist films
- D.R. McKean
- R.D. Allen
- et al.
- 1992
- Microlithography 1992
Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1992
- Microlithography 1992
Overlay measurements using the scanning electron microscope: accuracy and precision
- Michael G. Rosenfield
- 1992
- Microlithography 1992
Critical alignments in plane mirror interferometry
- N. Bobroff
- 1992
- Microlithography 1992
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Effects of polymer end groups on chemical amplification
- Hiroshi Ito
- William P. England
- et al.
- 1992
- Microlithography 1992