Conducting polymers as lithographic materials
- Marie Angelopoulos
- J.M. Shaw
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
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2 results at International Technical Conference on Photopolymers 1991
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991