SOLUTION CHARACTERIZATION OF POLYAMIC ACIDS AND POLYIMIDES.
- P. Metzger Cotts
- W. Volksen
- 1983
- ACS National Meeting 1983
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6 results at ACS National Meeting 1983
APPLICATIONS OF PHOTOINITIATORS TO THE DESIGN OF RESISTS FOR SEMICONDUCTOR MANUFACTURING.
- Hiroshi Ito
- Grant Willson
- 1983
- ACS National Meeting 1983
DEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).
- H. Hiraoka
- L.W. Welsh Jr.
- 1983
- ACS National Meeting 1983
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
DEPENDENCE OF DISSOLUTION RATE ON PROCESSING AND MOLECULAR PARAMETERS OF RESISTS.
- A.C. Ouano
- 1983
- ACS National Meeting 1983
ULTRAPURE POLYIMIDES: SYNTHESES AND APPLICATIONS.
- J. Duran
- N.S. Viswanathan
- 1983
- ACS National Meeting 1983