Publications

8 results at SPIE Advanced Lithography 2025

Wet clean oxidation for optimal line width and LER
- - Steven McDermott
  - Keith Donegan
  - et al.
- 2025
- SPIE Advanced Lithography 2025
The Semiconductor Supply Chain in an Era of Low GWP and/or PFAS-Free Gas Chemistries
- - Eric A. Joseph
  - Nathan Marchack
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists
- - Cong Liu
  - Joseph Lachowski
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- - KwangMo Choi
  - YunJi Kim
  - et al.
- 2025
- SPIE Advanced Lithography 2025
New Photoacid Generators Designed for Advanced EUV Patterning
- - Kamal P. Pandey
  - Emad Aqad
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Effect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance
- - EuiJin Ko
  - YooRim Jang
  - et al.
- 2025
- SPIE Advanced Lithography 2025
New Molecular Resist Design for Advanced Patterning
- - Vageesha Liyana Gunawardana
  - Emad Aqad
  - et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- - Benjamin D. Rafael-Naab
  - Jong Keun Park
  - et al.
- 2025
- SPIE Advanced Lithography 2025