BEOL dielectric processing for Cu-Low k nano interconnect-impact of plasma CVD initial transient phenomena (ITP)
- Son Van Nguyen
- Hosadurga Shobha
- et al.
- 2016
- PRiME/ECS Meeting 2016
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.