Fabrication of a full-size EUV pellicle based on silicon nitride
- Dario Goldfarb
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
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EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015