Effect of high NA "half-field" printing on overlay error
- Allen Gabor
- Martin Burkhardt
- et al.
- 2021
- SPIE Advanced Lithography 2021
Publications
Date
Featured collections
Popular topics
9 results at SPIE Advanced Lithography 2021
OCD enhanced: Implementation and validation of spectral interferometry for nanosheet inner spacer indentation
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
In-line Raman spectroscopy for stacked nanosheet device manufacturing
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Speeding up OPC by leveraging existing designs with machine learning
- Cheng Chi
- Julian Dolby
- et al.
- 2021
- SPIE Advanced Lithography 2021
Effect of surface temperature on GeSbTe damage formation during plasma processing
- L. Buzi
- J. M. Papalia
- et al.
- 2021
- SPIE Advanced Lithography 2021
Contact local CD uniformity optimization through etch shrink
- Eric Miller
- Junling Sun
- et al.
- 2021
- SPIE Advanced Lithography 2021
Process trace analytics for process development
- Robert J. Baseman
- Fateh A. Tipu
- et al.
- 2021
- SPIE Advanced Lithography 2021
Nanosheet Metrology Opportunities for Technology Readiness
- Mary Breton
- Daniel Schmidt
- et al.
- 2021
- SPIE Advanced Lithography 2021