Metal Gate/High-κ dielectric gate stack reliability; or how i learned to live with trappy oxidesBarry P. LinderEduard Cartieret al.2013ECS Meeting 2013
Deposited ALD SiO2 high-k/metal gate interface for high voltage analog and I/O devices on next generation alternative channels and FINFET device structuresS. SiddiquiM.M. Chowdhuryet al.2013ECS Meeting 2013