Scanning spreading resistance microscopy for carrier profiling beyond 32nm node
- J. Modyl
- G. Zschatzsch
- et al.
- 2012
- IWJT 2012
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Modifications of growth of strained silicon and dopant activation in silicon by cryogenic ion implantation and recrystallization annealing
- Hiroshi Itokawa
- Nathaniel C. Beriiner
- et al.
- 2012
- IWJT 2012