The trade-offs between thin and thick absorbers for EUV photomasks
- Gregory McIntyre
- Christian Zuniga
- et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
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3 results at SPIE Photomask Technology + EUV Lithography 2011
Total Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solution
- Moutaz Fakhry
- Yuri Granik
- et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
Using custom features to check OPC model performance
- Amr Abdo
- Ramya Viswanathan
- 2011
- SPIE Photomask Technology + EUV Lithography 2011