Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- Timothy A. Brunner
- Vinayan C. Menon
- et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
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4 results at Journal of Micro/Nanolithography, MEMS, and MOEMS
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Predicting substrate-induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Combinatorial overlay control for double patterning
- Christopher P. Ausschnitt
- Scott D. Halle
- 2009
- Journal of Micro/Nanolithography, MEMS, and MOEMS