Characterization of lattice strain from DX centers and persistent photocarriers in GaAlAsG.S. Cargill IIIA. Segmülleret al.1995Materials Chemistry & Physics
Diffusion in several materials relevant to Cu interconnection technologyD. Gupta1995Materials Chemistry & Physics
Electromigration in two-level interconnects of Cu and Al alloysC.-K. HuB. Luther1995Materials Chemistry & Physics