Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The adsorption of O2 on Ni(110) at 500 K has been studied using He diffraction. As the coverage is increased, low-coverage (3 × 1), (2 × 1), and high-coverage (3 × 1) phases are successively formed. An analysis of the diffraction intensities for the (2 × 1) and high-coverage (3 × 1) phases and a comparison with calculated electron-density contours shows that the Ni atoms are aligned in rows parallel to the [001] direction, and that the oxygen atoms are adsorbed at long bridge sites on the surface at a normal distance of ~ 0.3 Å above the Ni atoms. © 1984.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Michiel Sprik
Journal of Physics Condensed Matter
T.N. Morgan
Semiconductor Science and Technology
J.Z. Sun
Journal of Applied Physics