P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A procedure for the vapor deposition of a thick layer of silicon oxide was developed to confine thin polymer films between two rigid flat walls. For silicon oxide overlayers thicker than ∼ 1.5 μm the deposited silicon oxide layer is mechanically stable against heating above the glass transition temperature of the polymer. Neutron reflectivity measurements show that the interface between the polymer and the deposited silicon oxide is sharp, having a characteristic width of 1.5 nm. © 1994.
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Michiel Sprik
Journal of Physics Condensed Matter