NanoStack Transistor Architecture for CMOS 7A Node and Beyond
Shay Reboh, Chen Zhang, et al.
VLSI Technology and Circuits 2025
The gate-all-around (GAA) nanosheet (NS) field-effect-transistor (FET) is poised to replace FinFET in the 3 nm CMOS technology node and beyond, marking the second seminal shift in device architecture across the extensive 60-plus-year history of MOSFET. The introduction of a new device structure, coupled with aggressive pitch scaling, can give rise to reliability challenges. In this article, we present a review of the key reliability mechanisms in GAA NS FET, including bias temperature instability (BTI), hot carrier injection (HCI), gate oxide (Gox) time-dependent dielectric breakdown (TDDB), and middle-of-line (MOL) TDDB. We aim to not only underscore the unique reliability attributes inherent to NS architecture but also provide a holistic view of the status and prospects of NS reliability, taking into account the challenges posed by future scaling.
Shay Reboh, Chen Zhang, et al.
VLSI Technology and Circuits 2025
Weiman Yan, Ernest Wu, et al.
IRPS 2025
Valeria Bragaglia, Donato Francesco Falcone, et al.
B-MRS 2024
Simone Iadanza, Myriam Rihani, et al.
IEDM 2024