PaperExperimental study of the current flow in the quantum Hall regimeCh. Simon, B.B. Goldberg, et al.Physical Review B
PaperLow hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor depositionG.N. Parsons, J.H. Souk, et al.Journal of Applied Physics
Conference paperCharacterization of stacked die using die-to-wafer integration for high yield and throughputK. Sakuma, P. Andry, et al.ECTC 2008
PaperThermally stable ohmic contacts to n-type GaAs. VIII. Sputter-deposited InAs contactsH.-J. Kim, Masanori Murakami, et al.Journal of Applied Physics
