Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
A Simple Calculation of Process‐Zone Toughening by Microcracking
Abstract
The method introduced by Evans and colleagues to calculate transformation toughening resulting from a dilatant transformation is extended, using the Eshelby “equivalent inclusion” approach, to treat the case of toughening resulting from microcracking. Copyright © 1984, Wiley Blackwell. All rights reserved