Extendibility of NiPt silicide to the 22-nm node CMOS technology
Kazuya Ohuchi, Christian Lavoie, et al.
IWJT 2008
Reduction of specific contact resistivity is one of the key items for downscaling of device feature size. This paper discusses an accurate method of measuring specific contact resistivity by using our simple four-point probe test structure having a small area, the interface resistance of which is to be measured, fabricated on a substrate that has low sheet resistance. We also show its application for direct specific contact resistivity measurements of several systems that have dopant dependence, i.e., the NiPtSi/Si, NiPtSi/SiGe, and Pt silicide systems, as well as the metalmetal system between silicide and contact plug metal. © 2012 The Japan Society of Applied Physics.
Kazuya Ohuchi, Christian Lavoie, et al.
IWJT 2008
Relja Vasić, Steven Consiglio, et al.
Journal of Applied Physics
Kazuya Ohuchi, Christian Lavoie, et al.
IWJT 2008
F.A. Geenen, E. Solano, et al.
Journal of Applied Physics