Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
To combine in a single system the benefits of XPS and UPS, a noble gas cold cathode discharge lamp and a grazing incidence grating monochromator have been attached to a Hewlett-Packard 5950A ESCA spectrometer. Since the HP multichannel detection system was designed for the relatively low count rates associated with a monochromator dispersed X-ray source some customarily unavailable low intensity UV lines can be used. Photoemission spectra for 9 excitation lines of He and Ne spaced approximately every 4 eV between 16.7 and 48.4 eV are presented for a polycrystalline Au test sample. Operation of the ESCA spectrometer's electron optics and hemispherical analyzer for low kinetic energy (< 50 eV) electrons is described. © 1978.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gangulee, F.M. D'Heurle
Thin Solid Films
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters