Gate-all-around silicon nanowire MOSFETs and circuits
Jeffrey W. Sleight, Sarunya Bangsaruntip, et al.
DRC 2010
We report on the growth and doping of InAs by atomic layer epitaxy (ALE). The InAs layers were grown using ALE cycles in a metal organic chemical vapor deposition reactor, and Si doping of the films was studied for different SiH4 flow sequences. When SiH4 was added to trimethylindium during the group-III step, the silicon concentration in the film was above 5 × 1019 cm-3. When SiH4 was added to tertiarybutylarsine during the group-V step, much lower incorporation of Si was observed. Conformal Si doped InAs layers were selectively grown by ALE on In0.47Ga0.53As patterned layers made on silicon substrates, demonstrating the suitability of the growth method for III-V device technology on silicon.
Jeffrey W. Sleight, Sarunya Bangsaruntip, et al.
DRC 2010
Guy Cohen, E. Cartier, et al.
DRC 2010
Sarunya Bangsaruntip, A. Majumdar, et al.
VLSI Technology 2010
Haibo Gong, Rubab Ume, et al.
DRC 2021