PaperCrystallization kinetics of amorphous NiSix filmsR.D. Thompson, J. Angilello, et al.Thin Solid Films
PaperDiffusion in the amorphous phase of Pd-19-at.%-Si metallic alloyD. Gupta, K.N. Tu, et al.Physical Review Letters
PaperAtomic motion of dopant during interfacial silicide formationM. Wittmer, C.-Y. Ting, et al.Thin Solid Films
PaperElectrical transport properties of V3Si, V5Si3, and VSi2 thin filmsF. Nava, O. Bisi, et al.Physical Review B