E. Burstein
Ferroelectrics
A 1- mu m CMOS technology using thin p/p** plus epi and shallow retrograde n-well is demonstrated to be latchup free since the holding voltage for latchup is higher than the 5-V power supply. Good agreement is obtained between the experimental result and simulations using a two-dimensional finite-element numerical analysis program. The sensitivity of latchup holding voltage to epi thickness and other structural parameters is also studied in the simulation.
E. Burstein
Ferroelectrics
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Ronald Troutman
Synthetic Metals