S. Tiwari, J.J. Welser, et al.
DRC 1998
The author reports on a comparative evaluation of HFET enhancement/depletion (E/D) circuits operating at 77 K and 300 K and complementary circuits operating at 77 K. He shows that a modified short-channel MOSFET model gives good agreement with the experimental behavior of the HFET and that E/D circuits are more fan-out sensitive at 300 K than at 77 K. Fan-in sensitivities are shown to be much smaller than fan-out sensitivities. Under loaded conditions, 0. 5- mu m gate-length E/D structures show gate-delays near 50 pS and 1. 0- mu m gate-length E/D structures show gate-delays near 75 pS. The circuits at 300 K exhibit a doubling of the gate-delay. The complementary circuits offer, at 77 K, a performance of 70 pS at 0. 5- mu m gate-length and 140 pS at 1. 0- mu m gate-length. They demonstrate noise margins that are more than 50% better than their E/D counterpart with power dissipations significantly lower than the slightly larger than 1 mW required for E/D circuits. The larger noise margin may be a significant advantage because the small logic swings that exist in HFET circuits require stringent parasitic resistance and threshold voltage control.
S. Tiwari, J.J. Welser, et al.
DRC 1998
M. Heiblum
IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits 1984
S. Tiwari, F. Rana, et al.
DRC 1995
S. Tiwari, J.J. Welser, et al.
VLSI Technology 1997