PaperSynchronous collapses and revivals of atomic dipole fluctuations and photon fano factor beyond the standard quantum limitR.G. Devoe, R.G. BrewerPhysical Review Letters
Conference paperEffect of resist components on image spreading during postexposure bake of chemically amplified resistsW.D. Hinsberg, F.A. Houle, et al.Microlithography 2000