Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
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80 results for J. Hoffnagle
On the frequency-locked orbits of two particles in a Paul trap
- J. Hoffnagle
- R.G. Brewer
- 1994
- Science
Frequency-locked motion of two particles in a Paul trap
- J. Hoffnagle
- R.G. Brewer
- 1993
- Physical Review Letters
Transient two-ion chaos
- R.G. Brewer
- J. Hoffnagle
- et al.
- 1990
- Physical Review Letters
Collision-induced two-ion chaos
- R.G. Brewer
- J. Hoffnagle
- et al.
- 1990
- Nature
Order-chaos transition of two trapped ions
- J. Hoffnagle
- R.G. Devoe
- et al.
- 1988
- Physical Review Letters
Comment on Quantum effects in a macroscopic system
- A. Schenzle
- R.G. Devoe
- et al.
- 1987
- Physical Review Letters
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Wavefront generated by reflection of a plane wave from a conic section
- John A. Hoffnagle
- David L. Shealy
- 2008
- SPIE Optical Engineering + Applications 2008
Wavefront and caustic surfaces of refractive laser beam shaper
- David L. Shealy
- John A. Hoffnagle
- 2007
- SPIE Optical Engineering + Applications 2007