Kang-Wook Lee, Alan Lien, et al.
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
In spite of 50 years of history, there is still no consensus on the basic physics of Negative Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric, currently vie for dominance. The differences appear fundamental: one model holds that NBTI is a diffusion-limited process and the other holds that it is reaction-limited. Basic issues of disagreement are summarized and the main controversial aspects of each model are reviewed and contrasted.
Kang-Wook Lee, Alan Lien, et al.
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Aditya Bansal, Rahul Rao, et al.
Microelectronics Reliability
Narendra Parihar, Richard G. Southwick, et al.
IEEE T-ED
Miaomiao Wang, Ramachandran Muralidhar, et al.
IEEE Electron Device Letters